A novel low temperature etch approach to reduce ULK plasma damage

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Authors
Zhang, Liping; de Marneffe, Jean-Francois; Leroy, F.; Ljazouli, R.; Lefaucheux, P.; Tillocher, T; Dussart, R.; Maekawa, K.; Yatsuda, K.; Dussarrat, C.; De Gendt, Stefan; Baklanov, Mikhaïl
Conference
Plasma Etch and Strip in Microtechnology - PESM
Title
A novel low temperature etch approach to reduce ULK plasma damage
Publication type
Meeting abstract
Embargo date
9999-12-31
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