dc.contributor.author | Zotovich, A. | |
dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Proshina, O. | |
dc.contributor.author | Lopaev, D. | |
dc.contributor.author | Rakhimova, T. | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-23T01:41:58Z | |
dc.date.available | 2021-10-23T01:41:58Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26255 | |
dc.source | IIOimport | |
dc.title | Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | n/a | |
dc.source.conference | Plasma Etch and Strip in Microtechnology - PESM | |
dc.source.conferencedate | 27/04/2015 | |
dc.source.conferencelocation | Leuven Belgium | |
dc.identifier.url | http://pesm-conference.org/files/2015_abstractbook.pdf | |
imec.availability | Published - open access | |