Publication:
Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1885 since deposited on 2021-10-23
Acq. date: 2025-12-13
Citations
Metrics
Views
1885 since deposited on 2021-10-23
Acq. date: 2025-12-13
Citations