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Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
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1880 since deposited on 2021-10-23
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Acq. date: 2025-10-25
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Views
1880 since deposited on 2021-10-23
415item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations