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Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

Date

2015
Meeting abstract
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dc.contributor.authorZotovich, A.
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorProshina, O.
dc.contributor.authorLopaev, D.
dc.contributor.authorRakhimova, T.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-23T01:41:58Z
dc.date.available2021-10-23T01:41:58Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26255
dc.identifier.urlhttp://pesm-conference.org/files/2015_abstractbook.pdf
dc.source.beginpagen/a
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate27/04/2015
dc.source.conferencelocationLeuven Belgium
dc.title

Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

dc.typeMeeting abstract
dspace.entity.typePublication
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