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Atomic layer deposition of ruthenium for advanced interconnect applications
Publication:
Atomic layer deposition of ruthenium for advanced interconnect applications
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Date
2016
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Adelmann, Christoph
;
Popovici, Mihaela Ioana
;
Groven, Benjamin
;
Wen, Liang Gong
;
Dutta, Shibesh
;
Boemmels, Juergen
;
Tokei, Zsolt
;
Van Elshocht, Sven
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1987
since deposited on 2021-10-23
3
last month
Acq. date: 2025-12-10
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Metrics
Views
1987
since deposited on 2021-10-23
3
last month
Acq. date: 2025-12-10
Citations