Publication:

Atomic layer deposition of ruthenium for advanced interconnect applications

Date

2016

Meeting abstract

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Author(s)

Adelmann, Christoph

;

Popovici, Mihaela Ioana

;

Groven, Benjamin

;

Wen, Liang Gong

;

;

Boemmels, Juergen

;

;

Van Elshocht, Sven

Statistics

2008 since deposited on 2021-10-23

Acq. date: 2026-09-21