Self-aligned-quadruple-patterning for N7/N5 silicon fins

No Thumbnail [100%x80]
View/open
Metadata
Show full item record
Authors
Altamirano Sanchez, Efrain; Tao, Zheng; Gunay Demirkol, Anil; Lorusso, Gian; Hopf, Toby; Everaert, Jean-Luc; Sobieski, Daniel; Ou, Fung Suong; Hellin, David; Clark, William
Conference
SPIE Lithography Symposium Advanced Etch Technology for Nanopatterning V
Title
Self-aligned-quadruple-patterning for N7/N5 silicon fins
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections