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Advanced cleaning and ultra-thin oxide technology

dc.contributor.authorHeyns, Marc
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorKnotter, D. M.
dc.contributor.authorMertens, Paul
dc.contributor.authorMertens, S.
dc.contributor.authorMeuris, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorWolke, K.
dc.date.accessioned2021-09-30T12:11:58Z
dc.date.available2021-09-30T12:11:58Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2634
dc.sourceIIOimport
dc.titleAdvanced cleaning and ultra-thin oxide technology
dc.typeOral presentation
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conferenceSCP Symposium; 23-24 April 1998; Boise, ID, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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