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Low-frequency noise assessment in n- and p-channel sub-10nm triple-gate FinFETs

dc.contributor.authorBoudier, Dimitri
dc.contributor.authorCretu, Bogdan
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T10:09:41Z
dc.date.available2021-10-23T10:09:41Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26372
dc.sourceIIOimport
dc.titleLow-frequency noise assessment in n- and p-channel sub-10nm triple-gate FinFETs
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.conferenceJoint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - ULIS
dc.source.conferencedate25/01/2016
dc.source.conferencelocationWien Austria
imec.availabilityPublished - imec


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