Show simple item record

A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow

dc.contributor.authorClark, William
dc.contributor.authorJuncker, Aurelie
dc.contributor.authorPaladugu, E.
dc.contributor.authorFried, David
dc.contributor.authorWilson, Chris
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorGallagher, Emily
dc.contributor.authorde Jamblinne de Meux, Albert
dc.contributor.authorPiumi, Daniele
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorMocuta, Dan
dc.date.accessioned2021-10-23T10:20:26Z
dc.date.available2021-10-23T10:20:26Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26462
dc.sourceIIOimport
dc.titleA million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
dc.typeProceedings paper
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage43
dc.source.endpage46
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate6/09/2016
dc.source.conferencelocationNuremberg Germany
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7605144/
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
35264.pdf
Size:
888.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record