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A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
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Authors
Clark, William
;
Juncker, Aurelie
;
Paladugu, E.
;
Fried, David
;
Wilson, Chris
;
Pourtois, Geoffrey
;
Gallagher, Emily
;
de Jamblinne de Meux, Albert
;
Piumi, Daniele
;
Boemmels, Juergen
;
Tokei, Zsolt
;
Mocuta, Dan
Conference
International Conference on Simulation of Semiconductor Processes and Devices - SISPAD
Title
A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
Publication type
Proceedings paper
Embargo date
9999-12-31
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