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Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations

dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorKuppuswamy, V.K.M.
dc.contributor.authorGogolides, Evangelos
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-23T10:22:29Z
dc.date.available2021-10-23T10:22:29Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26476
dc.sourceIIOimport
dc.titleChallenges in LER/CDU metrology in DSA: placement error and cross-line correlations
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97781X
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate20/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2508357
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


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