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Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
Publication:
Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
Date
2016
Meeting abstract
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34585.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Decoster, Stefan
;
Paolillo, Sara
;
Kesters, Els
;
Briggs, Basoene
;
van der Veen, Marleen
;
Lazzarino, Frederic
;
Piumi, Daniele
;
Yamashita, Fumiko
;
Demand, Marc
;
Kumar, Kaushik
Journal
Abstract
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1979
since deposited on 2021-10-23
429
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1979
since deposited on 2021-10-23
429
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations