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Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
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Authors
Decoster, Stefan
;
Paolillo, Sara
;
Kesters, Els
;
Briggs, Basoene
;
van der Veen, Marleen
;
Lazzarino, Frederic
;
Piumi, Daniele
;
Yamashita, Fumiko
;
Demand, Marc
;
Kumar, Kaushik
Conference
Plasma Etch and Strip in Microtechnology - PESM
Title
Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
Publication type
Meeting abstract
Embargo date
9999-12-31
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