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Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node

dc.contributor.authorDecoster, Stefan
dc.contributor.authorPaolillo, Sara
dc.contributor.authorKesters, Els
dc.contributor.authorBriggs, Basoene
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPiumi, Daniele
dc.contributor.authorYamashita, Fumiko
dc.contributor.authorDemand, Marc
dc.contributor.authorKumar, Kaushik
dc.date.accessioned2021-10-23T10:30:35Z
dc.date.available2021-10-23T10:30:35Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26525
dc.sourceIIOimport
dc.titleProcess window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
dc.typeMeeting abstract
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate9/05/2016
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access


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