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Atomic layer processing of 2D materials for beyond CMOS applications

dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHeyne, Markus
dc.contributor.authorZhang, Haodong
dc.contributor.authorChiappe, Daniele
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.date.accessioned2021-10-23T10:31:29Z
dc.date.available2021-10-23T10:31:29Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26530
dc.sourceIIOimport
dc.titleAtomic layer processing of 2D materials for beyond CMOS applications
dc.typeMeeting abstract
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate24/07/2016
dc.source.conferencelocationDublin Ireland
imec.availabilityPublished - open access


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