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dc.contributor.authorDelabie, Annelies
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHeyne, Markus
dc.contributor.authorZhang, Haodong
dc.contributor.authorTomczak, Yoann
dc.contributor.authorCaymax, Matty
dc.contributor.authorRadu, Iuliana
dc.date.accessioned2021-10-23T10:31:40Z
dc.date.available2021-10-23T10:31:40Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26531
dc.sourceIIOimport
dc.titleChallenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides
dc.typeOral presentation
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewno
dc.source.conferenceWorkshop on Atomic Layer Deposition for 2D Materials
dc.source.conferencedate31/10/2016
dc.source.conferencelocationEindhoven The Netherlands
imec.availabilityPublished - imec


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