dc.contributor.author | Dervillé, A. | |
dc.contributor.author | Labrosse, A. | |
dc.contributor.author | Zimmermann, Y. | |
dc.contributor.author | Foucher, Johann | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Boeckx, Carolien | |
dc.contributor.author | Singh, Arjun | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Halder, Sandip | |
dc.date.accessioned | 2021-10-23T10:33:16Z | |
dc.date.available | 2021-10-23T10:33:16Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26539 | |
dc.source | IIOimport | |
dc.title | Next generation of decision making software for nanopatterns metrology: application to semiconductor industry | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Singh, Arjun | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 977836 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXX | |
dc.source.conferencedate | 21/02/2016 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507055&resultClick=1 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 9778 | |