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Transmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation

dc.contributor.authorJin, S.
dc.contributor.authorBender, Hugo
dc.contributor.authorLi, X.
dc.contributor.authorDong, C.
dc.contributor.authorZhang, Zheng
dc.date.accessioned2021-09-30T12:16:52Z
dc.date.available2021-09-30T12:16:52Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2653
dc.sourceIIOimport
dc.titleTransmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage260
dc.source.endpage261
dc.source.conferenceElectron Microscopy 96; Proceedings of EUREM-11, the 11th Conference on Electron Microscopy
dc.source.conferencedate26/08/1996
dc.source.conferencelocationDublin Ireland
imec.availabilityPublished - open access


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