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Reduction of NiGe/n- and p-Ge specific contact resistivity by enhanced dopant segregation in the presence of carbon during nickel germanidation
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Authors
Duan, N.
;
Luo, J.
;
Wang, G.
;
Liu, J.
;
Simoen, Eddy
;
Mao, S.
;
Radamson, H.
;
Wang, X.
;
Li, J.
;
Wang, W.
;
Zhao, C.
;
Ye, T.
ISSN
0018-9383
Issue
11
Journal
IEEE Transactions on Electron Devices
Volume
63
Title
Reduction of NiGe/n- and p-Ge specific contact resistivity by enhanced dopant segregation in the presence of carbon during nickel germanidation
Publication type
Journal article
Embargo date
9999-12-31
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