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dc.contributor.authorDutta, Shibesh
dc.contributor.authorOpsomer, Karl
dc.contributor.authorHoque, Anamul
dc.contributor.authorPeeters, Kristof
dc.contributor.authorRichard, Olivier
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-23T10:42:47Z
dc.date.available2021-10-23T10:42:47Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26588
dc.sourceIIOimport
dc.titleThickness dependence and annealing behavior of Pt-group metal thin films as alternative metals for advanced interconnects
dc.typeMeeting abstract
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage149
dc.source.endpage150
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM 2016
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access
imec.internalnotespaper PMT-11


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