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Characterization and mitigation of 3D mask effects in EUV lithography

dc.contributor.authorErdmann, Andreas
dc.contributor.authorXu, Dongbo
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-23T10:46:27Z
dc.date.available2021-10-23T10:46:27Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26605
dc.sourceIIOimport
dc.titleCharacterization and mitigation of 3D mask effects in EUV lithography
dc.typeOral presentation
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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