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Accurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulations

dc.contributor.authorEyben, Pierre
dc.contributor.authorMatagne, Philippe
dc.contributor.authorChiarella, Thomas
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorKubicek, Stefan
dc.contributor.authorMitard, Jerome
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.contributor.authorMocuta, Dan
dc.date.accessioned2021-10-23T10:46:55Z
dc.date.available2021-10-23T10:46:55Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26607
dc.sourceIIOimport
dc.titleAccurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulations
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecEyben, Pierre::0000-0003-3686-556X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage287
dc.source.endpage290
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate6/09/2016
dc.source.conferencelocationNürnberg Germany
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7605203
imec.availabilityPublished - imec


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