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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
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Authors
Kim, Young-Chang
;
Beckx, Stephan
;
Vanhaelemeersch, Serge
;
Vandervorst, Wilfried
Conference
4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
Title
Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
Publication type
Oral presentation
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