dc.contributor.author | Kim, Young-Chang | |
dc.contributor.author | Beckx, Stephan | |
dc.contributor.author | Vanhaelemeersch, Serge | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.date.accessioned | 2021-09-30T12:19:39Z | |
dc.date.available | 2021-09-30T12:19:39Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2664 | |
dc.source | IIOimport | |
dc.title | Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Beckx, Stephan | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.source.peerreview | no | |
dc.source.conference | 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 21/09/1998 | |
dc.source.conferencelocation | Oostende Belgium | |
imec.availability | Published - imec | |
imec.internalnotes | Publ. in 1999; Zie C3522 | |