Publication:
Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface
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1938 since deposited on 2021-09-30
3last month
2last week
Acq. date: 2026-08-28
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Statistics
Views
1938 since deposited on 2021-09-30
3last month
2last week
Acq. date: 2026-08-28
Citations