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Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface
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1933 since deposited on 2021-09-30
1last month
Acq. date: 2026-01-11
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Metrics
Views
1933 since deposited on 2021-09-30
1last month
Acq. date: 2026-01-11
Citations