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Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance

dc.contributor.authorGorhad, Kujan
dc.contributor.authorSharon, Ofir
dc.contributor.authorDmitriev, Vladimir
dc.contributor.authorCohen, Avi
dc.contributor.authorvan Haren, Richard
dc.contributor.authorRoelofs, Christian
dc.contributor.authorCekli, H.E.
dc.contributor.authorGallagher, Emily
dc.contributor.authorLeray, Philippe
dc.contributor.authorBeyer, Dirk
dc.contributor.authorTrautsch, Thomas
dc.contributor.authorSteinert, Steffen
dc.date.accessioned2021-10-23T10:58:58Z
dc.date.available2021-10-23T10:58:58Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26657
dc.sourceIIOimport
dc.titleCo-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance
dc.typeProceedings paper
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97783D
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2502514
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


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