Authors

Gorhad, Kujan; Sharon, Ofir; Dmitriev, Vladimir; Cohen, Avi; van Haren, Richard; Roelofs, Christian; Cekli, H.E.; Gallagher, Emily; Leray, Philippe; Beyer, Dirk; Trautsch, Thomas; Steinert, Steffen

Conference

Metrology, Inspection, and Process Control for Microlithography XXX

Title

Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance

Publication type

Proceedings paper

Embargo date

9999-12-31