Publication:

Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance

Date

2016
Proceedings Paper
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dc.contributor.authorGorhad, Kujan
dc.contributor.authorSharon, Ofir
dc.contributor.authorDmitriev, Vladimir
dc.contributor.authorCohen, Avi
dc.contributor.authorvan Haren, Richard
dc.contributor.authorRoelofs, Christian
dc.contributor.authorCekli, H.E.
dc.contributor.authorGallagher, Emily
dc.contributor.authorLeray, Philippe
dc.contributor.authorBeyer, Dirk
dc.contributor.authorTrautsch, Thomas
dc.contributor.authorSteinert, Steffen
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-23T10:58:58Z
dc.date.available2021-10-23T10:58:58Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26657
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2502514
dc.source.beginpage97783D
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance

dc.typeProceedings paper
dspace.entity.typePublication
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