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EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes

dc.contributor.authorGronheid, Roel
dc.contributor.authorBoeckx, Carolien
dc.contributor.authorDoise, Jan
dc.contributor.authorBekaert, Joost
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorRyckaert, Julien
dc.contributor.authorChan, BT
dc.contributor.authorLi, Chenxi
dc.contributor.authorZou, Yi
dc.date.accessioned2021-10-23T11:01:20Z
dc.date.available2021-10-23T11:01:20Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26666
dc.sourceIIOimport
dc.titleEUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorChan, BT
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97761W
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505814
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9776


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