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Comparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structure

dc.contributor.authorGroven, Benjamin
dc.contributor.authorClaes, Dieter
dc.contributor.authorHeyne, Markus
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorNuytten, Thomas
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorRadu, Iuliana
dc.contributor.authorThean, Aaron
dc.contributor.authorHeyns, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-23T11:01:54Z
dc.date.available2021-10-23T11:01:54Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26668
dc.sourceIIOimport
dc.titleComparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structure
dc.typeProceedings paper
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorClaes, Dieter
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.conference16th International Conference on Atomic Layer Deposition
dc.source.conferencedate24/07/2016
dc.source.conferencelocationDublin Ireland
imec.availabilityPublished - imec


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