dc.contributor.author | Kondoh, Eiichi | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Maex, Karen | |
dc.contributor.author | Gutt, T. | |
dc.contributor.author | Nényei, Z. | |
dc.date.accessioned | 2021-09-30T12:23:34Z | |
dc.date.available | 2021-09-30T12:23:34Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2679 | |
dc.source | IIOimport | |
dc.title | In-line ambient impurity measurement of a rapid thermal process chamber by using atmospheric pressure ionization mass spectrometer | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 51 | |
dc.source.endpage | 56 | |
dc.source.conference | Rapid Thermal and Integrated Processing VII | |
dc.source.conferencedate | 13/04/1998 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 525 | |