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Integration of Directed Self-Assembly (DSA) via patterning in sub-7nm interconnects - A designer's perspective

dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorDehaene, Wim
dc.contributor.authorRyckaert, Julien
dc.date.accessioned2021-10-23T11:38:55Z
dc.date.available2021-10-23T11:38:55Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26803
dc.sourceIIOimport
dc.titleIntegration of Directed Self-Assembly (DSA) via patterning in sub-7nm interconnects - A designer's perspective
dc.typeOral presentation
dc.contributor.imecauthorDehaene, Wim
dc.contributor.imecauthorRyckaert, Julien
dc.source.peerreviewno
dc.source.conferenceKULeuven Seminar on Advanced Interconnects
dc.source.conferencedate28/01/2016
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://www.esat.kuleuven.be/events/seminar-integration-of-directed-self-assembly-dsa-via-patterning-in-sub-7nm-interconnects-a-
imec.availabilityPublished - imec


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