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The impact of process variation and stochastic aging in nanoscale VLSI

dc.contributor.authorKiamehr, Saman
dc.contributor.authorWeckx, Pieter
dc.contributor.authorTahoori, Mehdi
dc.contributor.authorKaczer, Ben
dc.contributor.authorKukner, Halil
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorCatthoor, Francky
dc.date.accessioned2021-10-23T11:46:49Z
dc.date.available2021-10-23T11:46:49Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26828
dc.sourceIIOimport
dc.titleThe impact of process variation and stochastic aging in nanoscale VLSI
dc.typeProceedings paper
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorCatthoor, Francky
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.contributor.orcidimecCatthoor, Francky::0000-0002-3599-8515
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageCR-1
dc.source.conferenceInternational Reliability Physics Symposium - IRPS
dc.source.conferencedate2/04/2016
dc.source.conferencelocationPasadena, CA USA
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7574590/
imec.availabilityPublished - open access


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