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EUV process establishment through litho and etch for N7 node

dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorKubota, Minoru
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFoubert, Philippe
dc.contributor.authorMao, Ming
dc.date.accessioned2021-10-23T11:58:32Z
dc.date.available2021-10-23T11:58:32Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26863
dc.sourceIIOimport
dc.titleEUV process establishment through litho and etch for N7 node
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorMao, Ming
dc.source.peerreviewyes
dc.source.beginpage97760C
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505775
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9776


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