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Characterization of etch residues generated on damascene structures

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorConard, Thierry
dc.contributor.authorShen, M.
dc.contributor.authorBraun, S.
dc.contributor.authorBurk, Y.
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T12:04:18Z
dc.date.available2021-10-23T12:04:18Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26881
dc.sourceIIOimport
dc.titleCharacterization of etch residues generated on damascene structures
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewyes
dc.source.beginpage227
dc.source.endpage231
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.255.227
imec.availabilityPublished - imec


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