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Novel method to achieve area selective ALD on copper metal vs. SiO2using vapor-phase deposited SAMS

dc.contributor.authorLecordier, Laurent
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-23T12:04:51Z
dc.date.available2021-10-23T12:04:51Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26883
dc.sourceIIOimport
dc.titleNovel method to achieve area selective ALD on copper metal vs. SiO2using vapor-phase deposited SAMS
dc.typeMeeting abstract
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference16th International Atomic Layer Deposition Conference - ALD
dc.source.conferencedate24/07/2016
dc.source.conferencelocationDublin Ireland
imec.availabilityPublished - open access


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