Show simple item record

Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

dc.contributor.authorLorusso, Gian
dc.contributor.authorInoue, Osamu
dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorKoshihara, Shunsuke
dc.date.accessioned2021-10-23T12:20:57Z
dc.date.available2021-10-23T12:20:57Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26930
dc.sourceIIOimport
dc.titleLine width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97780V
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505740&resultClick=1
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


Files in this item

Thumbnail
Name:
35421.pdf
Size:
992.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record