Authors

Lorusso, Gian; Inoue, Osamu; Ohashi, Takeyoshi; Altamirano Sanchez, Efrain; Constantoudis, Vassilios; Koshihara, Shunsuke

Conference

Metrology, Inspection, and Process Control for Microlithography XXX

Title

Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Publication type

Proceedings paper

Embargo date

9999-12-31