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Conference contributions
Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
Publication:
Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
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Date
2016
Proceedings Paper
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35421.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lorusso, Gian
;
Inoue, Osamu
;
Ohashi, Takeyoshi
;
Altamirano Sanchez, Efrain
;
Constantoudis, Vassilios
;
Koshihara, Shunsuke
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1897
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations
Metrics
Views
1897
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations