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Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Date

2016
Proceedings Paper
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dc.contributor.authorLorusso, Gian
dc.contributor.authorInoue, Osamu
dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorKoshihara, Shunsuke
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-23T12:20:57Z
dc.date.available2021-10-23T12:20:57Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26930
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505740&resultClick=1
dc.source.beginpage97780V
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

dc.typeProceedings paper
dspace.entity.typePublication
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