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III-V fin patterning in SADP scheme

dc.contributor.authorMilenin, Alexey
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorSun, Noel
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorVertommen, Johan
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-23T12:50:46Z
dc.date.available2021-10-23T12:50:46Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27011
dc.sourceIIOimport
dc.titleIII-V fin patterning in SADP scheme
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorCamerotto, Elisabeth
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate9/05/2016
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttp://pesm2016.insight-outside.fr/index.php?langue=en&onglet=11&acces=&idUser=&emailUser=&messageConfirmation=
imec.availabilityPublished - open access


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