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Dopant segregation in Si and Ge CVD epitaxial growth

dc.contributor.authorMurota, Junichi
dc.contributor.authorYamamoto, Yuchi
dc.contributor.authorCostina, Ioan
dc.contributor.authorTillack, Bernd
dc.contributor.authorLe Thanh, Vin
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-23T13:10:02Z
dc.date.available2021-10-23T13:10:02Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27062
dc.sourceIIOimport
dc.titleDopant segregation in Si and Ge CVD epitaxial growth
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.beginpage7
dc.source.endpage8
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
imec.availabilityPublished - imec


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