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Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.

dc.contributor.authorPacco, Antoine
dc.contributor.authorDattilo, Davide
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRip, Jens
dc.contributor.authorDietze, Uwe
dc.contributor.authorKruemberg, Jens
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T13:26:59Z
dc.date.available2021-10-23T13:26:59Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27105
dc.sourceIIOimport
dc.titleOptimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.
dc.typeProceedings paper
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage357
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-Heist Belgium
imec.availabilityPublished - open access


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