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Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies

dc.contributor.authorLauwers, Anne
dc.contributor.authorBesser, Paul
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorRoelandts, Nico
dc.contributor.authorSteegen, An
dc.contributor.authorStucchi, Michele
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T12:31:41Z
dc.date.available2021-09-30T12:31:41Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2710
dc.sourceIIOimport
dc.titlePerformance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorBesser, Paul
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage99
dc.source.endpage101
dc.source.conferenceProceedings of the IEEE 1998 International Interconnect Technology Conference - IITC
dc.source.conferencedate1/06/1998
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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