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Mitigating EUV mask 3D effects by alternative metal absorbers

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorHendrickx, Eric
dc.contributor.authorErdmann, Andreas
dc.contributor.authorDongbo, Xu
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorEdrisi, Arash
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorIrmscher, Mathias
dc.contributor.authorNaasz, Sandra
dc.date.accessioned2021-10-23T13:41:12Z
dc.date.available2021-10-23T13:41:12Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27139
dc.sourceIIOimport
dc.titleMitigating EUV mask 3D effects by alternative metal absorbers
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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