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Plasma process induced physical damage on ultra thin gate oxide
Publication:
Plasma process induced physical damage on ultra thin gate oxide
Date
1998
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Hean-Cheal
;
Vanhaelemeersch, Serge
Journal
Abstract
Description
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Views
1975
since deposited on 2021-09-30
436
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1975
since deposited on 2021-09-30
436
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations