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Plasma process induced physical damage on ultra thin gate oxide

dc.contributor.authorLee, Hean-Cheal
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-09-30T12:32:47Z
dc.date.available2021-09-30T12:32:47Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2714
dc.sourceIIOimport
dc.titlePlasma process induced physical damage on ultra thin gate oxide
dc.typeOral presentation
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferencePlasma Processing XII; 4-8 May 1998; San Diego, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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