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Laser anneal of oxycarbosilane low-k film

dc.contributor.authorRedzheb, Murad
dc.contributor.authorArmini, Silvia
dc.contributor.authorVanstreels, Kris
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorBaklanov, Mikhail
dc.contributor.authorWang, Yun
dc.contributor.authorChen, Shaoyin
dc.contributor.authorLe, Van
dc.contributor.authorAwdshiew, Michael
dc.contributor.authorVan der Voort, Pascal
dc.date.accessioned2021-10-23T14:06:51Z
dc.date.available2021-10-23T14:06:51Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27201
dc.sourceIIOimport
dc.titleLaser anneal of oxycarbosilane low-k film
dc.typeProceedings paper
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage156
dc.source.endpage158
dc.source.conferenceInternational Interconnect Technology Conference/ Advanced Metallization Conference
dc.source.conferencedate23/05/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7507716/
imec.availabilityPublished - open access


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