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Cryogenic etching of porous low-k dielectrics in CF3Br plasma

dc.contributor.authorRezvanov, Askar
dc.contributor.authorMiakonkikh, A.
dc.contributor.authorVishnevskiy, A.
dc.contributor.authorGitshin, O.
dc.contributor.authorRudenko, K.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T14:10:52Z
dc.date.available2021-10-23T14:10:52Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27210
dc.sourceIIOimport
dc.titleCryogenic etching of porous low-k dielectrics in CF3Br plasma
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec


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