dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | dhayalan, | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Profijt, Harald | |
dc.contributor.author | Kohen, David | |
dc.contributor.author | Kubicek, Stefan | |
dc.contributor.author | Chiarella, Thomas | |
dc.contributor.author | Yu, Hao | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Mocuta, Dan | |
dc.contributor.author | Barla, Kathy | |
dc.contributor.author | Thean, Aaron | |
dc.contributor.author | Bartlett, Gregory | |
dc.contributor.author | Margetis, Joe | |
dc.contributor.author | Bhargava, Nupur | |
dc.contributor.author | Tolle, John | |
dc.date.accessioned | 2021-10-23T14:22:26Z | |
dc.date.available | 2021-10-23T14:22:26Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27237 | |
dc.source | IIOimport | |
dc.title | Selective epitaxial growth of high-P Si:P for dource/drain formation in advanced Si nFETs | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Kubicek, Stefan | |
dc.contributor.imecauthor | Chiarella, Thomas | |
dc.contributor.imecauthor | Yu, Hao | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Barla, Kathy | |
dc.contributor.imecauthor | Thean, Aaron | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
dc.contributor.orcidimec | Yu, Hao::0000-0002-1976-0259 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2003 | |
dc.source.conference | PRiME 2016 - 230th ECS Meeting (Fall) - Electrochemical Society: SiGe, Ge & Related Compounds: Materials, Processing and Devices | |
dc.source.conferencedate | 2/10/2016 | |
dc.source.conferencelocation | Honolulu, HI USA | |
dc.identifier.url | http://ma.ecsdl.org/content/MA2016-02/30/2003.abstract | |
imec.availability | Published - imec | |
imec.internalnotes | ECS Meeting Abstracts; Vol. MA2016-02 | |